Studio Dumbar

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New identity for dutch part of Shanghai Creative Week

2009-05-20

Studio Dumbar is chosen to develop the new strategic plan and visual identity for the Dutch participation in the Shanghai International Creative Industry Week (SICIW), that will take place in October 2009. This yearly week about design in Shanghai is organized by the Shanghai International Creative Industry Centre (SICIC).

The Dutch participation is initiated by Dutch Design Fashion and Architecture (DDFA) in collaboration with FAR architecture and design network China. It’s purpose is to promote Dutch Design in China and help the Dutch creative industry to get connected to the Chinese market. This year the event focuses on Architecture and public space.

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